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ArticlePolymers2026

Effect of Acid-Labile Protecting-Group Structure on the Micrometer-Scale Patterning Performance of Core-First RAFT-Synthesized Three-Arm Photoresists.

Jinyoung Kim et al.PubMed ↗Full text ↗Publisher ↗

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Effect of Acid-Labile Protecting-Group Structure on the Micrometer-Scale Patterning Performance of Core-First RAFT-Synthesized Three-Arm Photoresists. | OpenQuestion