ArticleSmall (Weinheim an der Bergstrasse, Germany)2026
Preventing Plasma-Induced Resist Hardening in Molybdenum Disulfide Transistors via Sacrificial Metal Mask Lithography.
Dahyeon Kim, Yanfeng Zhao, Sungyeon Kim, Seungchan Lee, Sangmin Eom, Tae Yeon Kim, Hyun Seok Lee, Joonki Suh, Byungjo Kim, Myungsoo Kim
Abstract read
In one paragraphArticle in Small (Weinheim an der Bergstrasse, Germany), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
2 · The registryThe trial behind it
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3 · Its place in the literatureWho cites it
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4 · The recordCorrections and comments
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5 · Who and what moneyAuthors and funding
10 authors.
Dahyeon KimDepartment of Electrical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea.
Sungyeon KimDepartment of Material Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea.
Seungchan LeeDepartment of Electrical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea.
Sangmin EomGraduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea.
Tae Yeon KimDepartment of Physics, Chungbuk National University, Cheongju, South Korea.
Hyun Seok LeeDepartment of Physics, Chungbuk National University, Cheongju, South Korea.
Byungjo KimGraduate School of Semiconductor Materials and Devices Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, Republic of Korea.
Funding
InnoCORE program by MSIT 1.260020.01InnoCORE program by MSIT 1.260036.01Korea Institute for Advancement of Technology (KIAT) P0023703Korea Institute of Science and Technology Information (KISTI) National Supercomputing Center KSC-2025-CRE-0318National Research Foundation (NRF) funded by the Ministry of Science and ICT (MSIT) IITP-2026-RS-2022-00156361National Research Foundation (NRF) funded by the Ministry of Science and ICT (MSIT) RS-2024-00337000National Research Foundation (NRF) funded by the Ministry of Science and ICT (MSIT) RS-2025-16064758National Research Foundation (NRF) funded by the Ministry of Science and ICT (MSIT) RS-2026-25578911
6 · The paper itselfAbstract
Achieving the theoretical performance of 2D molybdenum disulfide (MoS
Indexed as
2D materialsmolybdenum disulfidephotoresistresiduetransistors
Identifiers
PMID42576675
PMCPMC13653343
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