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ArticleACS applied materials & interfaces2026

Endurance Paradox in Hafnium-Oxide-Based Silicon-Channel Ferroelectric Transistors.

Apu Das et al.PubMed ↗Full text ↗Publisher ↗

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1 paper cites it

2026
this papercites it
Full record →Abstract, authors, funding and every citing paper · PMID 42081509