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ReviewNanoscale advances2025

Advances in core technologies for semiconductor manufacturing: applications and challenges of atomic layer etching, neutral beam etching and atomic layer deposition.

Tzu-Yi Lee et al.PubMed ↗Full text ↗Publisher ↗

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4 papers cite it

2025
2026
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Full record →Abstract, authors, funding and every citing paper · PMID 40226206