Evidence map›Paper›PMID 32041949›Full record

ArticleNature communications2020

Near-field sub-diffraction photolithography with an elastomeric photomask.

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee and 15 more

Abstract read
In one paragraph

Article in Nature communications, 2020. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 23 papers.

0numbers the graph read from it
0cells of the map it votes in
23citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

23 citing papers in PubMed.

  1. Enabling Scalable Nanoscale 3D Printing via Laser-Driven Termination.Small (Weinheim an der Bergstrasse, Germany) · 2026
    Article
  2. Article
  3. Article
  4. Article
  5. Review
  6. Article
  7. Article
  8. Review
  9. A 3D Printing Strategy for Hard Curved Surfaced Circuits: From Materials to Applications.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2025
    Review
  10. Review
  11. Article
  12. Metasurface-Embedded Contact Lenses for Holographic Light Projection.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2024
    Article
  13. Article
  14. Review
  15. Direct Printing of Ultrathin Block Copolymer Film with Nano-in-Micro Pattern Structures.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2023
    Article
  16. Article
  17. Transparent and Multi-Foldable Nanocellulose Paper Microsupercapacitors.Advanced science (Weinheim, Baden-Wurttemberg, Germany) · 2022
    Article
  18. Article
  19. Article
  20. Flexible and Stretchable Bioelectronics.Materials (Basel, Switzerland) · 2022
    Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

25 authors.

Sangyoon Paik *Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Gwangmook Kim *Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Sehwan ChangDepartment of Physics, Korea University, Seoul, 02841, Republic of Korea.
Sooun LeeDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Dana JinDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Kwang-Yong JeongDepartment of Physics, Korea University, Seoul, 02841, Republic of Korea.
I Sak LeeSchool of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea.
Jekwan LeeDepartment of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Republic of Korea.
Hongjae MoonDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Jaejun LeeDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Kiseok ChangR&D Center, LG Display, LG Science Park, Seoul, 07796, Korea.
Su Seok ChoiDepartment of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea.
Jeongmin MoonR&D Center, LG Display, LG Science Park, Seoul, 07796, Korea.
Soonshin JungR&D Center, LG Display, LG Science Park, Seoul, 07796, Korea.
Shinill KangSchool of Mechanical Engineering, Yonsei University, Seoul, 03722, Republic of Korea.
Wooyoung LeeDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Heon-Jin ChoiDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Hyunyong ChoiDepartment of Physics and Astronomy, and Institute of Applied Physics, Seoul National University, Seoul, Republic of Korea.
Hyun Jae KimSchool of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea.ORCID http://orcid.org/0000-0002-6879-9256
Jae-Hyun LeeCenter for NanoMedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea.
Jinwoo CheonCenter for NanoMedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea.
Miso KimCenter for Safety Measurement, Korea Research Institute of Standards and Science (KRISS), Daejeon, 34113, Republic of Korea.
Jaemin MyoungDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea.
Hong-Gyu ParkDepartment of Physics, Korea University, Seoul, 02841, Republic of Korea.ORCID http://orcid.org/0000-0002-6375-0314
Wooyoung ShimDepartment of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Republic of Korea. wshim@yonsei.ac.kr.ORCID http://orcid.org/0000-0002-7601-6282

Funding

National Research Foundation of Korea (NRF) NRF-2018M3D1A1058793, 2017R1A2B2009751, 2015R1A5A1037668, 2016M3A7B4910798National Research Foundation of Korea (NRF) NRF-2018R1A2A1A05079060
6 · The paper itself

Abstract

Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10

Identifiers

PMID32041949
PMCPMC7010681

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.