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ArticleMicromachines2026

Rapid and High-Fidelity Fabrication of Embedded Elastomeric Photomask for Wafer-Scale Sub-Micrometer Conformal Contact Photolithography.

Huikang Liang et al.PubMed ↗Full text ↗Publisher ↗

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Full record →Abstract, authors, funding and every citing paper · PMID 42076232