ReviewScience and technology of advanced materials2019
New development of atomic layer deposition: processes, methods and applications.
Review in Science and technology of advanced materials, 2019. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 80 papers.
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Who cites it
80 citing papers in PubMed.
- Model for Predicting Film Thickness Depending on the Values of the Atomic Layer Deposition Process Parameters.ACS omega · 2026Article
- Copper Oxide Thin Films: Fabrication, Properties and Applications in Gas Sensing and Photoelectric Devices.Materials (Basel, Switzerland) · 2026Review
- Recent efforts of vapour-phase strategies for EUV resist toward high- and hyper-NA extreme ultraviolet lithography.Chemical science · 2026Review
- Visible-wavelength vectorial holography based on an MIM metasurface.Discover nano · 2026Article
- Supercapacitor Materials: Structure, Properties, and Applications for Energy Storage in Engineering Systems.Materials (Basel, Switzerland) · 2026Review
- Physics-based design and simulation of hollow-core anti-resonant fiber plasmonic sensors.Scientific reports · 2026Article
- Impact of Purge Regime and Reactor Volume on ALD ZnO and ZrOMaterials (Basel, Switzerland) · 2026Article
- Post-Release Metallization in MEMS Silicon-to-Silicon Contact Switches for On-Resistance Improvement.Micromachines · 2026Article
- Through Stronger Hindrance to Higher Reactivity: Influence of the Alkyl Chains on the Activation Energy of Ether Cleavage on Silicon.Angewandte Chemie (International ed. in English) · 2026Article
- Role of Nonplasma Oxidizing Agent on the Reaction Step in Atomic Layer Deposition of Titanium Oxide Thin Films.ACS omega · 2025Article
- Tuning cluster size down to single atoms on Pt/γ-AlChemical science · 2025Article
- Enabling ambient stability and quantum integration of organometallic magnonic ferrimagnets via atomic layer encapsulation.Nature communications · 2025Article
- Article
- Vapor Deposition Strategies for Copper-Based Electrocatalysts in COChemSusChem · 2025Review
- Design and Engineering of Semiconductor-Organic Interfaces: Multilayer Synthesis on the Si(001) Surface Based on Cyclooctyne Chemistry.Accounts of chemical research · 2025Article
- Catalysts Design and Atomistic Reaction Modulation by Atomic Layer Deposition for Energy Conversion and Storage Applications.Exploration (Beijing, China) · 2025Review
- Hydrogen Sensing via Heterolytic HChemSusChem · 2025Article
- Advances in core technologies for semiconductor manufacturing: applications and challenges of atomic layer etching, neutral beam etching and atomic layer deposition.Nanoscale advances · 2025Review
- Investigation and Optimization of Process Parameters on Growth Rate in AlMaterials (Basel, Switzerland) · 2025Article
- Solution-Processed Metal-Oxide Nanoparticles to Prevent The Sputtering Damage in Perovskite/Silicon Tandem Solar Cells.ACS applied materials & interfaces · 2025Article
20 more citing papers are in PubMed but not listed here.
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
5 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many applications owing to its distinct abilities. They include uniform deposition of conformal films with controllable thickness, even on complex three-dimensional surfaces, and can improve the efficiency of electronic devices. This technology has attracted significant interest both for fundamental understanding how the new functional materials can be synthesized by ALD and for numerous practical applications, particularly in advanced nanopatterning for microelectronics, energy storage systems, desalinations, catalysis and medical fields. This review introduces the progress made in ALD, both for computational and experimental methodologies, and provides an outlook of this emerging technology in comparison with other film deposition methods. It discusses experimental approaches and factors that affect the deposition and presents simulation methods, such as molecular dynamics and computational fluid dynamics, which help determine and predict effective ways to optimize ALD processes, hence enabling the reduction in cost, energy waste and adverse environmental impacts. Specific examples are chosen to illustrate the progress in ALD processes and applications that showed a considerable impact on other technologies.
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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.