ArticleMicromachines2018
SF₆ Optimized O₂ Plasma Etching of Parylene C.
Article in Micromachines, 2018. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.
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The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
5 citing papers in PubMed.
- Development of a PEGylated Parylene Nanopocket Membrane for the Capture and Release of Lipid Vesicles.bioRxiv : the preprint server for biology · 2025Article
- On reactive Ion Etching of Parylene-C with Simple Photoresist Mask for Fabrication of High Porosity Membranes to Capture Circulating and Exfoliated Tumor Cells.Micromachines · 2024Article
- Cleanroom strategies for micro- and nano-fabricating flexible implantable neural electronics.Philosophical transactions. Series A, Mathematical, physical, and engineering sciences · 2022Article
- Editorial for the Special Issue on Polymer Based MEMS and Microfabrication.Micromachines · 2019Article
- Microfabrication of Micropore Array for Cell Separation and Cell Assay.Micromachines · 2018Article
Corrections and comments
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Authors and funding
4 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility. It has been commonly adopted as a structural material for a variety of microfluidics and bio-MEMS (micro-electro-mechanical system) applications. However, it is still difficult to achieve a controllable Parylene C pattern, especially on film thicker than a couple of micrometers. Here, we proposed an SF₆ optimized O₂ plasma etching (SOOE) of Parylene C, with titanium as the etching mask. Without the SF₆, noticeable nanoforest residuals were found on the O₂ plasma etched Parylene C film, which was supposed to arise from the micro-masking effect of the sputtered titanium metal mask. By introducing a 5-sccm SF₆ flow, the residuals were effectively removed during the O₂ plasma etching. This optimized etching strategy achieved a 10 μm-thick Parylene C etching with the feature size down to 2 μm. The advanced SOOE recipes will further facilitate the controllable fabrication of Parylene C microstructures for broader applications.
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Registered trials
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