Evidence map›Paper›PMID 42819159›Full record

ArticleACS omega2026

Model for Predicting Film Thickness Depending on the Values of the Atomic Layer Deposition Process Parameters.

Vitaly Polomskikh, Diana Petkieva, Alexander Dudin, Grigory Rudakov

Abstract read
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In one paragraph

Article in ACS omega, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

4 authors.

Vitaly PolomskikhFGBUN Institut Nanotehnologij Mikroelektroniki Rossijskoj Akademii Nauk, Leninsky Prospect, 32A, Moscow 115487, Russia.ORCID https://orcid.org/0009-0009-9512-6725
Diana PetkievaFGBNU Rossijskij Naucnyj Centr Hirurgii Imeni Akademika B. V. Petrovskogo, Abrikosovsky Lane, 2, Moscow 119435, Russia.
Alexander DudinFGBUN Institut Nanotehnologij Mikroelektroniki Rossijskoj Akademii Nauk, Leninsky Prospect, 32A, Moscow 115487, Russia.
Grigory RudakovFGBUN Institut Nanotehnologij Mikroelektroniki Rossijskoj Akademii Nauk, Leninsky Prospect, 32A, Moscow 115487, Russia.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The ALD method is promising for producing thin films used in microelectronics. Optimization of ALD process parameters allows for shorter film production times and reduced reagent consumption. A model for predicting film thickness depending on process parameters was developed. Software was developed to determine the model's kinetic constants based on experimental data. The algorithm for finding the constants was tested using simulated experimental data. With a film thickness measurement error of ±2.6 nm, ten experimental points may be sufficient to find the optimal process parameters. The fundamental feasibility of using chemical-kinetic models with a large number of constants for practical application is demonstrated.

Identifiers

PMID42819159
PMCPMC13625083

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.