ArticleNanoscale advances2026
Submicron microdevice patterning with plasma-thinned nail-polish microfiber shadow masks.
Article in Nanoscale advances, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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6 authors.
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Abstract
Access to sub-micrometer electrode patterning remains limited in laboratories without lithographic or specialized mask-fabrication facilities. We present a novel, low-cost method for fabricating microdevices using nail-polish microfibers as shadow masks. A thin fiber is drawn by repeatedly touching a nail-polish droplet with a wire loop and placed directly onto the target substrate to define narrow features for metal deposition. As-drawn fibers reach diameters down to ∼2 µm and conform to both rigid and flexible surfaces. Oxygen-plasma thinning at ∼22 nm min
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