ArticleDental materials : official publication of the Academy of Dental Materials2026
Enhancing dentin bonding with catechol-based monomers by tailoring photoinitiator systems to overcome radical inhibition.
Article in Dental materials : official publication of the Academy of Dental Materials, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
objectiveAlthough catechol-functionalized polymers show promise for improving adhesion in wet environments, these catechol groups also inhibit free-radical polymerization, slowing kinetics, reducing conversion, increasing cytotoxicity, and compromising bonding performance. This study evaluates alternative photoinitiator systems to overcome catechol-induced inhibition in both etch-and-rinse and self-etch adhesives.
methodsCatechol methacrylamide (CMA) was incorporated into a methacrylate-based adhesive resin (0 to 5 wt%) as a partial replacement for the traditionally employed monomer 2-hydroxyethyl methacrylate (HEMA). The photopolymerization behavior of CMA-modified adhesives were investigated with varying photo-initiating systems, including type II photoinitiator systems camphorquinone (CQ)/ ethyl 4-(dimethylamino)benzoate (EDAB) and CQ/EDAB/diphenyliodonium hexafluorophosphate (DPIHP); type I systems diphenyl(2,4,6-trimethylbenzoyl) phosphine oxide (TPO) and di-p-tolyl(2,4,6-trimethylbenzoyl) phosphine oxide (TMO). Polymerization kinetics were monitored by real-time spectroscopy, while post-cured resins and bonded interfaces were evaluated by cell viability, micro-tensile bonding strength (μTBS) and interfacial structural analyses.
resultsStatistically significant polymerization retardation (one-way ANOVA) was observed when CMA was incorporated at low loadings (1 wt%) in resins with the type II systems CQ/EDAB and CQ/EDAB/DPIHP, whereas type I photoinitiators (TPO, TMO) maintained fast kinetics even at 5 wt% CMA loading. The enhanced kinetics associated with TPO and TMO correlated with improved cell viability. Generally, higher CMA loadings improved bonding strength and durability in both etch-and-rinse and self-etch systems, suggesting enhanced wet adhesion (two-way ANOVA). However, these improvements were not observed in self-etch type II systems, due to the significant polymerization retardation noted above. SIGNIFICANCE: Catechol-induced inhibition is mitigated by optimizing the photoinitiator system, enabling the improvement of dentin bonding without sacrificing polymerization efficiency.
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