ArticlePolymers2026
Poly(acrylic acid)-Containing Ceria Slurries for Shallow Trench Isolation Chemical Mechanical Polishing: Colloidal Stability, Planarization Efficiency, and Selectivity.
Article in Polymers, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
This study reports poly(acrylic acid) (PAA)-containing ceria slurries for shallow trench isolation (STI) chemical mechanical polishing (CMP). HNU15 ceria nanoparticles were prepared by precipitation at room temperature. PAA was synthesized by aqueous free-radical polymerization, characterized by gel permeation chromatography and Fourier-transform infrared spectroscopy, and used as the polymeric dispersant in both HNU15 and commercial HC10 slurries. The primary-particle sizes determined by TEM were 12.2 ± 1.5 nm for HNU15 and 14.6 ± 1.4 nm for HC10, whereas the crystallite sizes calculated from XRD were 10.2 nm and 8.7 nm, respectively. HNU15 showed a higher BET surface area and Ce
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