Evidence map›Paper›PMID 42569129›Full record

ArticleACS omega2026

In Situ Fluorine Doping of FZO Films by Atomic Layer Deposition.

Meryem Tunckanat, Bilge Imer

Abstract read
In one paragraph

Article in ACS omega, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

2 authors.

Meryem TunckanatMicro and Nanotechnology Department, Middle East Technical University, Ankara 06800, Türkiye.ORCID https://orcid.org/0009-0001-1397-0829
Bilge ImerMicro and Nanotechnology Department, Middle East Technical University, Ankara 06800, Türkiye.ORCID https://orcid.org/0000-0002-7336-5508

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

In optoelectronic devices, fluorine-doped semiconductors have been used widely. Atomic layer deposition (ALD) is one of the main processes integrated into semiconductor manufacturing and a perfect candidate to obtain conformally covered films for complex geometries at low temperatures on a budget. Due to the lack of a proper fluorine source, fluorine doping with ALD has been a challenge. In this study, fluorine-doped ZnO (FZO) thin films by ALD were successfully achieved, demonstrating the efficiency and practicality of a new homemade precursor mixture: ammonium fluoride/water (NH

Identifiers

PMID42569129
PMCPMC13448994

What OpenQuestion holds

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LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.