Evidence map›Paper›PMID 42532023›Full record

ArticleAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2026

Porous Ultralow-κ sp

Caiyun Liu, Ze Long, Zhongyuan Han, Yingying Guo, Yuning Ding, Tianhao Guo, Yuting Tang, Runzhi An, Haoran Ma, Jishan Liu and 2 more

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

12 authors.

Caiyun LiuState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.
Ze LongState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.ORCID https://orcid.org/0009-0009-3824-926X
Zhongyuan HanSchool of Integrated Circuits, Dalian University of Technology, Dalian, People's Republic of China.
Yingying GuoState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.
Yuning DingState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.
Tianhao GuoSchool of Integrated Circuits, Dalian University of Technology, Dalian, People's Republic of China.
Yuting TangSchool of Integrated Circuits, Dalian University of Technology, Dalian, People's Republic of China.
Runzhi AnState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.
Haoran MaSchool of Integrated Circuits, Dalian University of Technology, Dalian, People's Republic of China.
Jishan LiuShanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, People's Republic of China.
Hongwei LiangSchool of Integrated Circuits, Dalian University of Technology, Dalian, People's Republic of China.ORCID https://orcid.org/0000-0002-8231-2790
Hong YinState Key Laboratory of High Pressure and Superhard Materials, College of Physics, Jilin University, Changchun, People's Republic of China.ORCID https://orcid.org/0000-0002-5255-3737

Funding

Fundamental and Interdisciplinary Disciplines Breakthrough Plan of the Ministry of Education of China JYB2025XDXM107Key R&D Project of Scientific Development Department of Jilin Province of China 20240302099GXNational Natural Science Foundation of China 12335011National Natural Science Foundation of China 12505340
6 · The paper itself

Abstract

Dielectric materials with low dielectric constant (κ < 2) are highly needed to overcome a series of problems caused by the decreasing size of microelectronics. An effective way to reduce dielectric constant is introducing void structure in dielectric materials, however challenging in mechanical strength and wetting properties. Herein, porous sp

Indexed as

diffusion barrier capabilitymechanically stableporous BNultralow dielectric constant

Identifiers

PMID42532023
PMCPMC13423504

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.