Evidence map›Paper›PMID 42512982›Full record

ArticleMicromachines2026

Research on Processing Temperature of Atmospheric Pressure Microwave Plasma Based on Fused Silica Etching.

Xiang Wu, Bin Fan, Qiang Xin, Dawei Luo, Bo Gao, Wei Li, Zhentian Guan, Qiang Chen

Abstract read
In one paragraph

Article in Micromachines, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Xiang WuInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
Bin FanInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
Qiang XinInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.ORCID 0009-0007-3788-3934
Dawei LuoInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
Bo GaoInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
Wei LiInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.ORCID 0009-0005-2380-2334
Zhentian GuanInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.
Qiang ChenInstitute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

This study investigates the processing temperature characteristics and etching behavior of fused silica using an atmospheric pressure microwave plasma jet. The temperature distribution within the processing region was measured in real time via infrared thermography. The effects of microwave input power, argon flow rate, and CF

Indexed as

etching behavioroptical processingplasmaprocessing methodtemperature characteristics

Identifiers

PMID42512982
PMCPMC13413825

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.