Evidence map›Paper›PMID 42483793›Full record

ArticleAdvanced materials (Deerfield Beach, Fla.)2026

Metal-Ligand Coordination Enables Molecular Resist-Based Direct Write Lithography of Metal Halides.

Prakash Sarkar, Gurupada Ghorai, Harihar Mondal, Shivani Malvi, Rohit Thakur, Sougata Karmakar, A V Muhammed Ali, Vasant G Sathe, Abhay A Sagade, D S Shankar Rao and 5 more

Abstract read
In one paragraph

Article in Advanced materials (Deerfield Beach, Fla.), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
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1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

15 authors.

Prakash SarkarSchool of Applied & Interdisciplinary Sciences, Indian Association for the Cultivation of Science (IACS), Kolkata, India.
Gurupada GhoraiSchool of Applied & Interdisciplinary Sciences, Indian Association for the Cultivation of Science (IACS), Kolkata, India.
Harihar MondalSchool of Applied & Interdisciplinary Sciences, Indian Association for the Cultivation of Science (IACS), Kolkata, India.
Shivani MalviUGC-DAE Consortium for Scientific Research, Indore, India.
Rohit ThakurCentre for Nano and Soft Matter Sciences (CeNS), Bengaluru, India.
Sougata KarmakarSchool of Applied & Interdisciplinary Sciences, Indian Association for the Cultivation of Science (IACS), Kolkata, India.ORCID https://orcid.org/0009-0003-3474-1560
A V Muhammed AliCentre for Nano and Soft Matter Sciences (CeNS), Bengaluru, India.ORCID https://orcid.org/0000-0002-7599-8827
Vasant G SatheUGC-DAE Consortium for Scientific Research, Indore, India.
Abhay A SagadeLaboratory for Advanced Nanoelectronic Devices, Department of Physics and Nanotechnology, Faculty of Engineering and Technology, SRM Institute of Science and Technology, Kattankulathur, Tamil Nadu, India.ORCID https://orcid.org/0000-0002-3299-7103
D S Shankar RaoCentre for Nano and Soft Matter Sciences (CeNS), Bengaluru, India.
Subbarao Krishna PrasadCentre for Nano and Soft Matter Sciences (CeNS), Bengaluru, India.
H S S Ramakrishna MatteCentre for Nano and Soft Matter Sciences (CeNS), Bengaluru, India.
Lakshminarayana PolavarapuCINBIO, Department of Physical Chemistry, Campus Universitario as Lagoas-Marcosende, Universidade de Vigo, Vigo, Spain.
Praveen Kumar VelpulaUGC-DAE Consortium for Scientific Research, Indore, India.
K D M RaoSchool of Applied & Interdisciplinary Sciences, Indian Association for the Cultivation of Science (IACS), Kolkata, India.ORCID https://orcid.org/0000-0002-5966-3306

Funding

Science and Engineering Research Board CRG/2022/004873Technical Research Center AI/I/65/IACS/2014G
6 · The paper itself

Abstract

Lithographic patterning of semiconductor materials is essential for most modern optoelectronic devices. However, traditional inorganic and nanocrystal derived resists exhibit low electron-dose sensitivity, weak solubility contrast, and limited chemical compatibility, restricting high resolution functional lithography. Here, we present a molecular complex platform that converts ordinary metal halides (MXn; nine compositions) into intrinsically electron beam responsive, solution processable resists for direct write electron beam lithography. Coordination of MX

Indexed as

direct‐write electron beam lithographyfunctional devicesmetal halidemolecular resistnanofabricationRGB nano‐pixels

Identifiers

PMID42483793
PMCPMC13532444

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.