ArticleAdvanced materials (Deerfield Beach, Fla.)2026
High Numerical Aperture Metalens for the Deep Ultraviolet.
Article in Advanced materials (Deerfield Beach, Fla.), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 3 papers.
What it found
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
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Who cites it
3 citing papers in PubMed.
- Bound States in the Continuum Active Metasurfaces for Tunable Amplified Photoluminescence and Single-Photon Emission.Nanomaterials (Basel, Switzerland) · 2026Article
- High Numerical Aperture Metalens for the Deep Ultraviolet.Advanced materials (Deerfield Beach, Fla.) · 2026Article
- Recent Developments in Deep-Ultraviolet Flat Optics.Nanophotonics (Berlin, Germany) · 2026Review
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
9 authors.
Funding
Abstract
Deep-ultraviolet (DUV) radiation is essential for advanced nanofabrication, biomedical imaging, and emerging photonic technologies, yet the absence of compact, high-performance optical components in this spectral range has impeded progress. We demonstrate an aluminum nitride (AlN) metalens with record-high numerical aperture (HNA) from 0.9 to 0.7, operating at 266 nm. Optical measurements confirm diffraction-limited focusing performance. Importantly, we show a direct laser writing microscopy (DLWM) that lithographic direct writing serves microscopy purposes for the HNA metalens: besides enabling nanofabrication with 100 nm level critical dimension, it provides a universal characterization method for HNA DUV metalenses, addressing the challenges of constructing broadband HNA optical characterization systems in this wavelength range. Furthermore, the HNA AlN metalens for the first time integrates into a confocal photoluminescence system, enabling compact sub-micrometer spectroscopic imaging with DUV excitation and a confocal photoluminescence imaging system using a metalens (NA = 0.7), resolving isolated features down to 300 nm. This work establishes AlN metalenses as a transformative and practical platform for high-resolution DUV applications.
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Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.