Evidence map›Paper›PMID 42414248›Full record

ArticleNano letters2026

Activating Phase-Transition Toughening in van der Waals Semiconductor GaTe.

Ruihan Xu, Boxiang Gao, Danlei Zhao, Jingzhuo Zhou, Qi Zhu, Yupeng Ma, Binzhao Li, Yi Zhang, Juzheng Chen, Qian Zhang and 4 more

Abstract read
In one paragraph

Article in Nano letters, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

14 authors.

Ruihan XuDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Boxiang GaoDepartment of Materials Science and Engineering, City University of Hong Kong, Kowloon999077, China.ORCID 0000-0001-8422-5941
Danlei ZhaoState Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian116023, People's Republic of China.
Jingzhuo ZhouDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Qi ZhuDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Yupeng MaDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Binzhao LiDepartment of Mechanical Engineering, City University of Hong Kong, Kowloon999077, China.
Yi ZhangDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Juzheng ChenDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Qian ZhangDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Fanling MengDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.
Johnny C HoDepartment of Materials Science and Engineering, City University of Hong Kong, Kowloon999077, China.ORCID 0000-0003-3000-8794
Maolin YuState Key Laboratory of Structural Analysis, Optimization and CAE Software for Industrial Equipment, Department of Engineering Mechanics, Dalian University of Technology, Dalian116023, China.
Yang LuDepartment of Mechanical Engineering, The University of Hong Kong, Hong Kong999077, China.ORCID 0000-0002-9280-2718

Funding

Fundamental Research Funds for the Central Universities DUT25RC(3)007National Natural Science Foundation of China (NSFC) 12202194National Natural Science Foundation of China (NSFC) 12525205Research Grants Council, University Grants Committee 17205225Research Grants Council, University Grants Committee CRS_CityU101/24State Key Laboratory of Structural Analysis for Industrial Equipment S25303
6 · The paper itself

Abstract

Inorganic semiconductors are essential for modern electronics, but their inherent brittleness restricts their applications in flexible and wearable devices. This issue is particularly acute in low-symmetry structures, where the lack of slip systems further suppresses plastic deformation. Here, we reveal an intrinsic toughening mechanism in monoclinic GaTe using in situ SEM microfracture experiments. In contrast to the catastrophic brittle cleavage along the interlayer direction, cross-layer crack propagation undergoes continuous deflection, generating a highly tortuous crack path that enhances the mean fracture toughness by ∼60%. Combining high-resolution imaging with atomic simulations, we identify stress-triggered monoclinic-to-trigonal phase transitions at deflection points, which effectively impede and redirect crack propagation. The toughening mechanism is further validated in a flexible GaTe photodetector, which retains an excellent photoresponse and mechanical durability over tens of thousands of bending cycles. These findings lay a solid foundation for nanodevice applications in which both mechanical robustness and functional stability are required.

Indexed as

crack propagationfracture toughnessin situ mechanicsphase transition

Identifiers

PMID42414248
PMCPMC13430690

What OpenQuestion holds

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LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.