Evidence map›Paper›PMID 42397186›Full record

ArticleChemical communications (Cambridge, England)2026

Wafer-scale robust graphene electronics under industrial processing conditions.

E P van Geest, B S Can, M Makurat, C Maheu, H Sezen, M D Barnes, D Bijl, M Buscema, S Shankar, D J Wehenkel and 4 more

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Chemical communications (Cambridge, England), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Substrate-Tight Graphene Transmembrane-nanofluidic Devices.Small (Weinheim an der Bergstrasse, Germany) · 2026
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

14 authors.

E P van GeestLeiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands. g.f.schneider@chem.leidenuniv.nl.ORCID http://orcid.org/0000-0002-0760-1920
B S CanLeiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands. g.f.schneider@chem.leidenuniv.nl.ORCID http://orcid.org/0009-0006-0502-1400
M MakuratLeiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands. g.f.schneider@chem.leidenuniv.nl.ORCID http://orcid.org/0000-0003-0406-723X
C MaheuNantes Université, CNRS, Institut des Matériaux de Nantes Jean Rouxel, IMN, F-44000, Nantes, France.ORCID http://orcid.org/0000-0001-5417-5672
H SezenSurface Science Laboratory, Department of Materials and Geosciences, Technical University of Darmstadt, Peter-Grünberg-Straße 4, 64287, Darmstadt, Germany.ORCID http://orcid.org/0000-0002-5438-3305
M D BarnesApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.
D BijlApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.ORCID http://orcid.org/0009-0004-6533-3954
M BuscemaApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.ORCID http://orcid.org/0009-0008-1132-0815
S ShankarApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.
D J WehenkelApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.
R van RijnApplied Nanolayers B.V. Feldmannweg 17, 2628 CD, Delft, The Netherlands.
J P HofmannSurface Science Laboratory, Department of Materials and Geosciences, Technical University of Darmstadt, Peter-Grünberg-Straße 4, 64287, Darmstadt, Germany.ORCID http://orcid.org/0000-0002-5765-1096
J M van RuitenbeekLeiden Institute of Physics, Leiden University, Kamerlingh Onnes Laboratory, Niels Bohrweg 2, 2333 CA, Leiden, The Netherlands. ruitenbeek@physics.leidenuniv.nl.ORCID http://orcid.org/0000-0003-0381-0132
G F SchneiderLeiden Institute of Chemistry, Leiden University, Einsteinweg 55, 2333CC, Leiden, The Netherlands. g.f.schneider@chem.leidenuniv.nl.ORCID http://orcid.org/0000-0002-3156-4525

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

When commercial grade electronic devices contain nanomaterials like graphene, it is crucial that these materials resist industrial processes and harsh environments. For environments that contain water, graphene delamination due to intercalation is a notorious problem. This renders graphene incompatible with key wafer-processing steps in the semiconductor industry. In this work, a covalent pyrene-based adhesion layer is synthesized in a facile, two-step procedure. Through π-π interactions, the adhesion of graphene to silicon wafers was maintained under harsh processing conditions,

Identifiers

PMID42397186
PMCPMC13330647

What OpenQuestion holds

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LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.