Evidence map›Paper›PMID 42380086›Full record

ArticleLight, science & applications2026

Interferometric scattering for optical tomoslicing of transparent solids.

Yuan Chai, Hong-Hua Fang, Zhen-Ze Li, Tian-Wei Wang, Shao-Feng Liu, Hong-Ren Chen, Shu-Chang Li, Xiao-Yan Li, Jia-Ming Lyu, Hong-Bo Sun

Abstract read
In one paragraph

Article in Light, science & applications, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

10 authors.

Yuan ChaiState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China.
Hong-Hua FangState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China. hfang@ruc.edu.cn.ORCID http://orcid.org/0000-0003-3636-1011
Zhen-Ze LiState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China.ORCID http://orcid.org/0009-0000-3448-8794
Tian-Wei WangState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China.
Shao-Feng LiuState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China.
Hong-Ren ChenState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China.
Shu-Chang LiMechano-X Institute, Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing, 100084, China.
Xiao-Yan LiMechano-X Institute, Applied Mechanics Laboratory, Department of Engineering Mechanics, Tsinghua University, Beijing, 100084, China.
Jia-Ming LyuState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China. 20252758@bistu.edu.cn.
Hong-Bo SunState Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing, 100084, China. hbsun@tsinghua.edu.cn.ORCID http://orcid.org/0000-0003-2127-8610

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

While light scattering is widely utilized in optical metrology and measurement, it has long been regarded as detrimental in laser-material processing. Here, we report an interferometric scattering effect that overturns this conventional view by resolving the six-decade challenge of axial resolution in optical manufacturing. This breakthrough elevates the axial resolution from micrometers, e.g., ~2 µm in transparent solids slicing, to the sub-10 nm level. The underlying mechanism involves the controlled sequential generation of nano-scatterers through interference between the incident laser and deliberately seeded scattering centers. Based on this phenomenon, we developed an interferometric scattering-based optical tomoslicing technology (i-SOT), achieving kerf widths as narrow as 7 nm under an industrial standard efficiency of up to 400 mm²/s. This unprecedented axial resolution enables nearly lossless laser wafering from ingots-reducing mass loss from ~30% to below 1% - with transformative potential for manufacturing laser crystals, photovoltaics, and microelectronic chips.

Identifiers

PMID42380086
PMCPMC13320215

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.