Atomic-Level Polishing of Single-Crystal Diamond Using a Combination of Reactive Ion Etching and Chemical Mechanical Polishing.

Rongchen Zhang, Xiangbing Wang, Xuejian Cui, Yi Hong, Nan Jiang, Xiangdong Yang, Jian Yi

Abstract read

In one paragraph

Article in Materials (Basel, Switzerland), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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4 · The record

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5 · Who and what money

Authors and funding

7 authors.

Rongchen ZhangState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.ORCID 0009-0002-9871-3510

Xiangbing WangState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.

Xuejian CuiState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.

Yi HongState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.

Nan JiangState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.

Xiangdong YangInstitute of Micro/Nano Materials and Devices, Ningbo University of Technology, Ningbo 315211, China.

Jian YiState Key Laboratory of Advanced Marine Materials, Zhejiang Key Laboratory of Extreme-Environmental Material Surfaces and Interfaces, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China.ORCID 0000-0001-7314-0213

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Single-crystal diamond (SCD) is an ideal substrate material for semiconductor devices due to its extremely wide bandgap and exceptionally high thermal conductivity. However, diamond's extreme hardness and chemical inertness pose challenges for the fabrication of ultra-smooth surfaces. Traditional polishing processes are not only inefficient but also prone to introducing subsurface defects, which severely degrade device performance. To address the above issues, this study proposes a hybrid polishing process combining reactive ion etching (RIE) surface modification with chemical mechanical polishing (CMP), which enables low-loss atomic-level processing of SCD. The study found that RIE treatment induces lattice disorder on the diamond surface, forming a sp

Indexed as

atomic surfacechemical mechanical polishingreactive ion etchingsurface modification

Identifiers

PMID42355258

DOI10.3390/ma19122677

PMCPMC13302979

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.