ArticleJournal of synchrotron radiation2026
An induction heating system for in situ X-ray diffraction imaging: design, simulation and application to dislocation dynamics in semiconductors.
Article in Journal of synchrotron radiation, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
We present a compact induction heating system for time-resolved in situ X-ray diffraction imaging, enabling contact-free volumetric heating of samples up to approximately 1600°C with flexible operation in different working modes. Real-time, spatially resolved thermography is achieved using an integrated near-infrared camera. A three-dimensional finite-element model of electromagnetic heating, steady-state heat transfer and thermo-elastic stress predicts Joule heating, temperature fields and resolved shear stresses, and guides experimental design. The system has been demonstrated at a synchrotron topography station using simultaneous X-ray white-beam topography and infrared thermography during controlled heating of an indented Si(001) wafer. Dislocation activity is observed starting at local temperatures above 1000°C, increasing at higher temperatures. The experimentally observed number of dislocations on individual {111}〈110〉 glide systems correlates with the simulated resolved shear stresses. This integrated approach enables quantitative, time-resolved studies of dislocation dynamics under well defined thermal conditions and offers a simulation-guided route to tailoring temperature gradients and stress fields for future materials and in situ experiments.
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