Evidence map›Paper›PMID 42236484›Full record

ReviewMicrosystems & nanoengineering2026

Advances in silicon carbide pressure sensors for high-temperature extreme environment sensing.

Chen Wu, Xudong Fang, Hao Sun, Zhongkai Zhang, Meng Shi, Zhaojun Liu, Ziyan Fang, Yuefei Yan, Qiang Kang, Ryutaro Maeda and 3 more

Abstract readReview
In one paragraph

Review in Microsystems & nanoengineering, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

13 authors.

Chen WuState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Xudong FangState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China. dongfangshuo30@xjtu.edu.cn.ORCID http://orcid.org/0000-0002-0956-3833
Hao SunState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.ORCID http://orcid.org/0000-0002-9042-0310
Zhongkai ZhangState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.ORCID http://orcid.org/0000-0002-7069-6504
Meng ShiState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Zhaojun LiuState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.ORCID http://orcid.org/0000-0002-7407-8543
Ziyan FangState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Yuefei YanXi'dian University, Xi'an, 710071, China.
Qiang KangXi'dian University, Xi'an, 710071, China.
Ryutaro MaedaState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Bian TianState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Libo ZhaoState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.
Zhuangde JiangState Key Laboratory for Manufacturing Systems Engineering, International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technologies, Xi'an Jiaotong University, Xi'an, 710049, China.

Funding

China Postdoctoral Science Foundation 2024M752567National Natural Science Foundation of China (National Science Foundation of China) 52175517National Natural Science Foundation of China (National Science Foundation of China) 52405599
6 · The paper itself

Abstract

In fields such as aerospace, geothermal energy, Venus exploration, and nuclear power safety, large-scale equipment often operates under extreme conditions characterized by high temperatures, radiation, corrosive gases, and vibration. Pressure monitoring at critical locations is essential for equipment condition monitoring, fault diagnosis, and improving operational efficiency. Microelectromechanical system (MEMS) sensors, with advantages including small size, high integration, and batch manufacturability, represent the mainstream application of industrial intelligent sensors. However, traditional silicon (Si)-based pressure sensors are limited by material properties, and the performance degrades due to PN junction leakage current and mechanical deformation. While silicon-on-insulator (SOI) sensors still face challenges, such as high-temperature plastic deformation and insufficient reliability. Silicon carbide (SiC), as a third-generation wide-bandgap semiconductor, offers significant advantages, including a high bandgap, radiation resistance, and corrosion resistance. These properties make SiC a promising substrate material for overcoming the bottleneck in high-temperature pressure sensing. Nevertheless, the current study is confined to a laboratory prototype. Performance under extreme conditions needs to be enhanced, especially the allowable operating temperature range, sensitivity, and stability. This paper reviews the evolution of various types of high-temperature pressure sensors systematically. Key technologies for SiC pressure sensors, including structural design, sensor chip fabrication, high-temperature ohmic contacts, packaging and reliability validation, are discussed. The latest research progress is summarized, and existing technical problems are analyzed. Finally, the challenges for SiC high-temperature pressure sensor research are discussed, and perspectives on future development trends are presented. This review aims to provide theoretical support and innovative directions for SiC pressure sensing technologies in extreme environments.

Identifiers

PMID42236484
PMCPMC13233958

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.