Evidence map›Paper›PMID 42185403›Full record

ArticleScientific reports2026

A hybrid approach for suppressing ambipolar current in short-channel TFETs based on zigzag antimonene nanoribbons.

Amirreza Ghazi, Arash Yazdanpanah-Goharrizi

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Article in Scientific reports, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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5 · Who and what money

Authors and funding

2 authors.

Amirreza GhaziDepartment of Electrical Engineering, Shahid Beheshti University, Tehran, Iran.
Arash Yazdanpanah-GoharriziDepartment of Electrical Engineering, Shahid Beheshti University, Tehran, Iran. ar_yazdanpanah@sbu.ac.ir.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

In this paper, we report a tunnel field-effect transistor (TFET) based on a zigzag antimonene nanoribbon (ZSbNR) with a 12 nm channel length, simulated using density functional theory (DFT). This study investigates the effects of the drain pocket (DP), underlap, and lightly doped drain (LDD) techniques on ambipolar current and overall performance in short-channel TFETs utilizing low-dimensional materials. However, the first two methods increased short-channel effects (SCEs), indicating limited effectiveness in short-channel TFETs. The third technique, LDD, despite decreasing the OFF-current, reduced the ambipolar current by only about 40 times. This motivated the adoption of a hybrid approach to mitigate both SCEs and ambipolar current simultaneously. The DP method shows strong capability in reducing ambipolarity. A 4 nm DP decreases the ambipolar current by two orders of magnitude, and further increasing the DP length enhances this effect. However, it also leads to a sharp increase in the OFF-current, degrading the subthreshold swing and severely limiting its applicability. The underlap method, by contrast, has a weaker influence on ambipolar suppression but causes less degradation in the OFF-state characteristics. When combined with the LDD technique, the underlap's suppression effect is significantly enhanced, while its adverse impact on the OFF-current is mitigated. Specifically, employing a 3 nm underlap together with a 4 nm LDD with a modified doping concentration reduces the ambipolar current by more than 600 times, while keeping the OFF-current nearly unchanged compared to the initial TFET. Finally, the proposed hybrid approach reduces the intrinsic delay time by more than threefold, demonstrating its substantial effectiveness in improving the overall device performance.

Indexed as

Ambipolar currentDrain pocket (DP)Gate underlapLightly doped drain (LDD)TFETZigzag antimonene nanoribbon (ZSbNR)

Identifiers

PMID42185403
PMCPMC13434275

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