Evidence map›Paper›PMID 42179540›Full record

ArticleACS omega2026

Coupled Roles of Surface Chemistry and Hydrogen-Assisted Cycling in Ruthenium Atomic Layer Deposition on Silicon Oxides.

Shixian Ha, Hwan Oh, Won Il Lee, Md Istiaque Chowdhury, Xiao Tong, Mingzhao Liu, Chang-Yong Nam

Abstract read
In one paragraph

Article in ACS omega, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Shixian HaDepartment of Material Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States.
Hwan OhCenter for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States.
Won Il LeeCenter for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States.ORCID https://orcid.org/0000-0003-1043-9933
Md Istiaque ChowdhuryCenter for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States.ORCID https://orcid.org/0000-0002-1920-2978
Xiao TongCenter for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States.
Mingzhao LiuDepartment of Material Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States.ORCID https://orcid.org/0000-0002-0999-5214
Chang-Yong NamDepartment of Material Science and Chemical Engineering, Stony Brook University, Stony Brook, New York 11794, United States.ORCID https://orcid.org/0000-0002-9093-4063

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Ruthenium (Ru) is a promising interconnect material for advanced semiconductor technologies due to its favorable scaling characteristics, including a short electron mean free path and strong electromigration resistance. In semiconductor integration, silicon oxide-based dielectrics serve as dominant insulating materials and constitute ubiquitous interfaces for metallization; however, their formation-dependent surface chemistry and its impact on Ru growth remain insufficiently explored. Here, we investigate Ru ALD on native oxide SiO

Identifiers

PMID42179540
PMCPMC13191501

What OpenQuestion holds

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LicenceCC BY-NC-ND
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.