Evidence map›Paper›PMID 42175777›Full record

ArticleJournal of microscopy2026

Flash electropolishing for TEM: Reducing FIB-induced defects in tungsten with protocols for new materials.

Yan-Ru Lin, Weicheng Zhong, Sabrina E Calzada, Timothy G Lach, Lauren J Nuckols, Chad M Parish, Steven J Zinkle, M Grace Burke

Abstract read
In one paragraph

Article in Journal of microscopy, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Yan-Ru LinMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Weicheng ZhongMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Sabrina E CalzadaMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Timothy G LachMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Lauren J NuckolsFusion Energy Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Chad M ParishMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
Steven J ZinkleMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.
M Grace BurkeMaterials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee, USA.

Funding

Foundational Fusion Materials R&D program, Office of Fusion Energy Sciences DE-AC05-00OR22725Foundational Fusion Materials R&D program, Office of Fusion Energy Sciences LAB 24-3295Oak Ridge National Laboratory (MGB and YRL)the Laboratory Directed Research and Development Program
6 · The paper itself

Abstract

Focused ion beam (FIB) milling has become the dominant approach for site-specific transmission electron microscopy (TEM) specimen preparation; however, FIB damage remains a critical limitation for reliable microstructural characterisation, particularly in radiation effects studies. Tungsten is especially susceptible to FIB damage due to its high nuclear stopping power, which promotes the formation and strong diffraction contrast of FIB-induced 'black spot' defects that are indistinguishable from very fine irradiation-induced loops/defects resulting from low to intermediate temperature neutron irradiation. In this work, flash electropolishing is systematically evaluated as a post-FIB treatment for minimising preparation-induced artefacts for TEM analysis of tungsten-based alloys. Using a range of non-, ion-, and neutron-irradiated tungsten materials, the effectiveness of flash electropolishing has been assessed through direct comparison with conventional FIB and plasma-FIB preparation including low-energy Ga, Ar, Xe ion cleaning. The results demonstrate that flash electropolishing effectively removes FIB-damaged layers and 'black spot' defects, thereby enabling reliable observation of irradiation-induced dislocation structures. Key processing parameters governing flash electropolishing quality - including lamella thickness, applied voltage, polishing duration, electrolyte chemistry, and cathode geometry - have been systematically evaluated, and clear criteria were established for determining when flash electropolishing is required to ensure reliable microstructural analysis. This work also provides practical guidance for implementing flash electropolishing as an artefact-controlled specimen-preparation approach for TEM characterisation of FIB-produced specimens. The systematic protocol can be extended to other, non-tungsten materials. LAY DESCRIPTION: Flash electropolishing is demonstrated as an effective post-FIB treatment for removing preparation-induced damage in tungsten TEM specimens, including FIB-induced 'black spot' defects that can obscure irradiation microstructures. Through systematic comparison with conventional and plasma-FIB methods across irradiated and non-irradiated tungsten alloys, key processing parameters and reliability criteria are established. The work provides a practical, artefact-controlled preparation protocol for accurate radiation-damage characterisation and offers a broadly adaptable strategy for other material systems.

Indexed as

electropolishingfocused ion beam (FIB) damageion implantationradiation damageTEM sample preparationtransmission electron microscopy (TEM)

Identifiers

PMID42175777
PMCPMC13397229

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.