Evidence map›Paper›PMID 42156384›Full record

ArticleNature communications2026

Broadband extreme ultraviolet zeroth order scatterometry for nanostructure metrology.

Francesco Corazza, Emmanouil Kechaoglou, Leo Guery, Zhonghui Nie, Parikshit Phadke, Carl S Lehmann, Roland Bliem, Peter M Kraus

Abstract read
In one paragraph

Article in Nature communications, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Francesco CorazzaAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands. f.corazza@arcnl.nl.ORCID http://orcid.org/0000-0001-7078-6393
Emmanouil KechaoglouAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.
Leo GueryAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.
Zhonghui NieAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.
Parikshit PhadkeAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.
Carl S LehmannAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.ORCID http://orcid.org/0009-0000-0716-0902
Roland BliemAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands.ORCID http://orcid.org/0000-0002-8714-8942
Peter M KrausAdvanced Research Center for Nanolithography, Amsterdam, The Netherlands. p.kraus@arcnl.nl.ORCID http://orcid.org/0000-0002-2989-5560

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

The continuous shrinkage of critical dimensions in nanofabrication demands nanometrology at the relevant resolution, which can be achieved using short-wavelength light sources. Most industrial metrology uses periodic structures for process control, exploiting diffraction to probe the fabrication quality of actual device structures. Here, we introduce a table-top high-harmonic generation extreme-ultraviolet scatterometry with broadband illumination. Our method exploits the spectrally resolved 0

Identifiers

PMID42156384
PMCPMC13381958

What OpenQuestion holds

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LicenceCC BY
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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.