Evidence map›Paper›PMID 42147408›Full record

ArticleACS applied electronic materials2026

Atomic Layer Etching of Nickel Using N

Ali Mohamed Ali, Guillaume Krieger, Jean-Philippe Soulié, Harm C M Knoops, Wilhelmus M M Kessels, Stefan De Gendt, Souvik Kundu, Jean-François de Marneffe

Abstract read
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In one paragraph

Article in ACS applied electronic materials, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Ali Mohamed AliDept. of Chemistry, K.U. Leuven, Celestijnenlaan 200F, Leuven B-3001, Belgium.ORCID https://orcid.org/0000-0002-2925-8641
Guillaume KriegerDept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven 5600 MB, Netherlands.ORCID https://orcid.org/0000-0002-6787-8251
Jean-Philippe Souliéimec v.z.w., Kapeldreef 75, Leuven B-3001, Belgium.
Harm C M KnoopsDept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven 5600 MB, Netherlands.ORCID https://orcid.org/0000-0003-2284-4477
Wilhelmus M M KesselsDept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, Eindhoven 5600 MB, Netherlands.ORCID https://orcid.org/0000-0002-7630-8226
Stefan De GendtDept. of Chemistry, K.U. Leuven, Celestijnenlaan 200F, Leuven B-3001, Belgium.
Souvik Kunduimec v.z.w., Kapeldreef 75, Leuven B-3001, Belgium.
Jean-François de Marneffeimec v.z.w., Kapeldreef 75, Leuven B-3001, Belgium.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Nickel (Ni) and its aluminides are key materials in extreme ultraviolet lithography masks and nanoscale interconnects, where precise patterning is essential. However, the engineering of Ni-based intermetallics poses significant challenges due to their high physical stability and chemical inertness. This study introduces a plasma-enhanced atomic layer etching (ALE) method for Ni, relying on a surface modification by a N

Indexed as

anisotropic etchingatomic layer etchingextreme ultraviolet lithographyHhfacN2/H2 plasmanickelplasma-enhanced etching

Identifiers

PMID42147408
PMCPMC13175136

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.