ArticleSmall (Weinheim an der Bergstrasse, Germany)2026
Wafer-Scale Deterministic Fabrication of Axis-Ratio-Engineered Silicon Nanoparticles for On-Resonance Electric-Magnetic Dipole Interference.
Article in Small (Weinheim an der Bergstrasse, Germany), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
High-index dielectric nanoparticles support coexisting electric and magnetic dipole resonances whose interference governs directional scattering. Achieving reproducible control of this interference has remained challenging. Here, we report a wafer-scale top-down fabrication strategy that yields silicon nanoparticles with exceptional uniformity (coefficient of variation 1.7%-2.4%), enabling deterministic axis-ratio (AR) tuning as a design parameter. By defining pillar geometry and precisely controlling annealing and oxidation, we tune dipolar mode overlap to realize on-resonance Kerker-type forward scattering with a forward-to-backward ratio of 12.5, which is among the highest reported for single silicon nanoparticles under comparable substrate-supported finite-NA measurement geometries. At the optimized AR = 2.1, this near-Kerker condition enables ultrasensitive refractometric sensing and label-free monitoring of protein-corona formation in serum, achieving a resolution of ~10
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