ArticleMicrosystems & nanoengineering2026
Facile, etch-free atomic layer-coated resist templates for rapid prototyping of efficient visible metasurfaces.
Article in Microsystems & nanoengineering, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
1 citing paper in PubMed.
- Modal contrast engineering in ultraviolet and visible metalenses enabled by material-selective hybridization.Nature communications · 2026Article
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
9 authors.
Funding
No grant is acknowledged in the PubMed record.
Abstract
Metasurfaces have emerged as transformative platforms for manipulating light at subwavelength scales, enabling functionalities such as wavefront shaping, polarization control, and holography within ultrathin optical elements. However, the realization of high-efficiency metasurfaces in the visible spectrum remains limited by complex and time-costly nanofabrication processes involving a thick layer of high-index material deposition, hard mask patterning, and plasma-based etching. Here, we present a streamlined, etch-free nanofabrication strategy based on electron-beam resist that directly serves both as the patterning medium and the functional material. The polymeric nanostructures are patterned through a single-step lithography process, eliminating the need for etching or lift-off, which significantly reduces fabrication complexity. To overcome the intrinsic limitations of low-index resist, we introduce an ultrathin (28 nm) atomic layer of TiO
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.