Evidence map›Paper›PMID 41951602›Full record

ArticleNature communications2026

Turing-patterned Ta

Xu Tian, Songjie Yang, Xiaoyu Liu, Yupu Tang, Shanshan Ju, Renbo Lei, Jinxiong Li, Yuancan Ding, Shengcheng Zhou, Juntong Kang and 6 more

Abstract read
In one paragraph

Article in Nature communications, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

16 authors.

Xu TianSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.ORCID http://orcid.org/0009-0003-8909-070X
Songjie YangSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Xiaoyu LiuSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Yupu TangSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Shanshan JuSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Renbo LeiSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Jinxiong LiSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Yuancan DingSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Shengcheng ZhouSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Juntong KangSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Yuyang QiaoSchool of Integrated Circuits, Peking University, Beijing, PR China.
Yi ZhouSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China.
Runsheng WangSchool of Integrated Circuits, Peking University, Beijing, PR China.
Ming LiSchool of Integrated Circuits, Peking University, Beijing, PR China.
Gaoda ChaiSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China. chaigaoda@pku.edu.cn.
Xinwei WangSchool of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen, PR China. wangxw@pkusz.edu.cn.ORCID http://orcid.org/0000-0002-1191-8162

Funding

National Natural Science Foundation of China (National Science Foundation of China) 22175005National Natural Science Foundation of China (National Science Foundation of China) 62125401
6 · The paper itself

Abstract

As semiconductor technology advances towards the 15-Å node and beyond, the back-end-of-line (BEOL) metal interconnect technology encounters severe scaling challenge, because the conventional barrier/liner TaN/Ta(Co) bilayer cannot be proportionally thinned down as the pitch size shrinks. This challenge arouses significant resistance-capacitance (RC) delay that is currently the bottleneck for advanced integrated circuits. Herein, we propose a Turing-patterned Ta

Identifiers

PMID41951602
PMCPMC13237385

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC-ND
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.