ArticleAdvanced science (Weinheim, Baden-Wurttemberg, Germany)2026
Reconfigurable, Temperature Resilient Phase-Change Metasurfaces Fabricated via High Throughput Nanoimprinting Lithography.
Article in Advanced science (Weinheim, Baden-Wurttemberg, Germany), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
The combination of metasurfaces with chalcogenide phase-change materials is a highly promising route toward the development of multifunctional and reconfigurable nanophotonic devices. However, their transition into real-world devices is hindered by several technological challenges. This includes, amongst others, the lack of large area photonic architectures produced via scalable nanofabrication methods as required for free-space photonic applications, along with the ability to withstand the high temperatures needed for the phase-change process. In this work, we present a scalable nanofabrication strategy for the production of reconfigurable metasurfaces based on high-throughput, large-area nanoimprint lithography that is fully compatible with chalcogenide phase-change materials processing. Our approach involves the direct imprinting of high-melting-point, thermally stable TiO
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