Evidence map›Paper›PMID 41858874›Full record

ArticleScience and technology of advanced materials2026

Sputtering yield for metal halide perovskite devices patterning.

Erfu Wu, Sergey Tsarev, Xuqi Liu, Daria Proniakova, Sergii Yakunin, Maksym V Kovalenko, Ivan Shorubalko

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In one paragraph

Article in Science and technology of advanced materials, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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0cells of the map it votes in
0citing papers in PubMed
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1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

7 authors.

Erfu WuTransport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.
Sergey TsarevDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Zürich, Switzerland.
Xuqi LiuDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Zürich, Switzerland.
Daria ProniakovaDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Zürich, Switzerland.
Sergii YakuninDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-6409-0565
Maksym V KovalenkoDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, ETH Zürich, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-6396-8938
Ivan ShorubalkoTransport at Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.ORCID https://orcid.org/0000-0001-9868-7303

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Metal halide perovskites (MHPs) are emerging semiconductors with unique optoelectronic properties promising for highly rewardable applications. Water and polar solvents instability hinders the introduction of MHPs into CMOS technology infrastructure and is the main challenge for patterning and integration into electronic systems. Recently, dry etching in combination with standard lithography was demonstrated as a viable technology to address the problem. In this work, we investigate the dry etching of MHPs using argon (Ar) ion milling. Simulated etch rates using Ziegler's model are validated with experimental measurements. Assuming a linear sum of elemental sputtering yields results in total sputtering yield values for complex MHPs (CsPbIBr

Indexed as

Argon ion millingdry etchingperovskitesputtering ratesputtering yield

Identifiers

PMID41858874
PMCPMC12997472

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.