Evidence map›Paper›PMID 41848494›Full record

ArticleAdvanced materials (Deerfield Beach, Fla.)2026

Patterning of Lead Halide Perovskite Device Stacks on CMOS Readout Using Selective Microfabrication Protocols.

Sergey Tsarev, Erfu Wu, Kyuik Cho, Xuqi Liu, Quang Nhat Dang Lung, Emeric Hartman, Tian Sun, Bekir Turedi, Gebhard J Matt, Stefanie Frick and 5 more

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Advanced materials (Deerfield Beach, Fla.), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

15 authors.

Sergey TsarevDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0001-7634-1088
Erfu WuDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0001-7728-5284
Kyuik ChoLaboratory of Integrated Systems, Department of Information Technology and Electrical Engineering, Zürich, Switzerland.ORCID https://orcid.org/0009-0001-4271-7881
Xuqi LiuDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0009-0002-2478-0358
Quang Nhat Dang LungDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-9779-9378
Emeric HartmanDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.
Tian SunDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.
Bekir TurediDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0003-2208-0737
Gebhard J MattDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-1138-3671
Stefanie FrickLaboratory For Surface Science and Coating Technologies, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.ORCID https://orcid.org/0009-0000-1762-4969
Sebastian SiolLaboratory For Surface Science and Coating Technologies, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.ORCID https://orcid.org/0000-0002-0907-6525
Taekwang JangLaboratory of Integrated Systems, Department of Information Technology and Electrical Engineering, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-4651-0677
Ivan ShorubalkoTransport At Nanoscale Interfaces Laboratory, Empa - Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, Switzerland.ORCID https://orcid.org/0000-0001-9868-7303
Sergii YakuninDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-6409-0565
Maksym V KovalenkoDepartment of Chemistry and Applied Biosciences, Laboratory of Inorganic Chemistry, Zürich, Switzerland.ORCID https://orcid.org/0000-0002-6396-8938

Funding

ETH Zürich through the ETH+ Project SynMatLab: Laboratory for Multiscale Materials Synthesis
6 · The paper itself

Abstract

Lead halide perovskites represent a promising class of semiconductor materials, notable for their unique optoelectronic properties. However, their application in advanced semiconductor devices, such as CMOS image sensors, photonic integrated circuits, and memristors, requires the development of precise, perovskite-specific patterning processes compatible with standard cleanroom fabrication. Here, we introduce several key innovations enabling standard microfabrication with lead halide perovskites. First, surface passivation with sorbitan laurate effectively seals the perovskite grain boundaries, enabling the use of standard photoresists (e.g., AZ1518) and aqueous developers on complete device stacks. Furthermore, a modified phosphoric acid etchant, incorporating phenylbutylammonium bromide (PBABr), facilitates the selective etching of transparent conductive oxides (TCOs) such as ITO directly atop the perovskite stack without significant degradation of the active layer. Finally, SF

Indexed as

complementary metal‐oxide semiconductorimage sensorlead‐halide perovskiteslithography, patterningmonolithic integrationphotodetector

Identifiers

PMID41848494
PMCPMC13073071

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.