Evidence map›Paper›PMID 41838571›Full record

ArticleACS applied materials & interfaces2026

Defect Engineering in Atomic-Layer-Deposited Cerium Oxide.

Rudi Tschammer, Marcel Schmickler, Yuliia Kosto, Karsten Henkel, Parmish Kaur, Anjana Devi, Carlos Morales, Jan Ingo Flege

Abstract read
In one paragraph

Article in ACS applied materials & interfaces, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Growth and interface formation in CeONanoscale advances · 2026
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Rudi TschammerApplied Physics and Semiconductor Spectroscopy, BTU Cottbus-Senftenberg, Cottbus 03046, Germany.
Marcel SchmicklerLeibniz Institute for Solid State and Materials Research, Dresden 01069, Germany.ORCID 0009-0007-3485-4118
Yuliia KostoApplied Physics and Semiconductor Spectroscopy, BTU Cottbus-Senftenberg, Cottbus 03046, Germany.ORCID 0000-0002-6983-4068
Karsten HenkelApplied Physics and Semiconductor Spectroscopy, BTU Cottbus-Senftenberg, Cottbus 03046, Germany.ORCID 0000-0001-7212-019X
Parmish KaurInorganic Materials Chemistry, Ruhr University Bochum, Bochum 44801, Germany.
Anjana DeviLeibniz Institute for Solid State and Materials Research, Dresden 01069, Germany.ORCID 0000-0003-2142-8105
Carlos MoralesApplied Physics and Semiconductor Spectroscopy, BTU Cottbus-Senftenberg, Cottbus 03046, Germany.ORCID 0000-0001-5890-1950
Jan Ingo FlegeApplied Physics and Semiconductor Spectroscopy, BTU Cottbus-Senftenberg, Cottbus 03046, Germany.ORCID 0000-0002-8346-6863

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

This study explores the role of atomic layer deposition (ALD) as an enabling technique for the defect engineering of catalytically active ultrathin deposits. In particular, we demonstrate the feasibility of tuning the O/Ce ratio in thermal ALD-based cerium oxide layers grown on silicon-based or alumina substrates by using the organometallic precursor tris(N, N'-diisopropyl-2-dimethylamido-guanidinato)cerium(III) ([Ce(dpdmg)

Indexed as

atomic layer depositioncerium oxidedefect engineeringinelastic peak shape analysisultrathin filmsX-ray photoelectron spectroscopy

Identifiers

PMID41838571
PMCPMC13051452

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.