Evidence map›Paper›PMID 41807772›Full record

ArticleNature materials2026

Two-dimensional crystalline hard masks for high-aspect-ratio nanofabrication.

Pranavram Venkatram, Ziheng Chen, Krishnendu Mukhopadhyay, Bob Hengstebeck, Lei Ding, Vlastimil Mazanek, Yang Yang, Zdenek Sofer, Saptarshi Das

Abstract read
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In one paragraph

Article in Nature materials, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Pranavram Venkatram *Engineering Science and Mechanics, Penn State University, University Park, PA, USA.
Ziheng Chen *Engineering Science and Mechanics, Penn State University, University Park, PA, USA.
Krishnendu MukhopadhyayEngineering Science and Mechanics, Penn State University, University Park, PA, USA.
Bob HengstebeckMaterials Characterization Lab, Penn State University, University Park, PA, USA.
Lei DingEngineering Science and Mechanics, Penn State University, University Park, PA, USA.ORCID http://orcid.org/0000-0001-7842-5277
Vlastimil MazanekDepartment of Inorganic Chemistry, University of Chemistry and Technology Prague, Prague, Czech Republic.
Yang YangEngineering Science and Mechanics, Penn State University, University Park, PA, USA.ORCID http://orcid.org/0000-0002-0025-5914
Zdenek SoferDepartment of Inorganic Chemistry, University of Chemistry and Technology Prague, Prague, Czech Republic.
Saptarshi DasEngineering Science and Mechanics, Penn State University, University Park, PA, USA. sud70@psu.edu.ORCID http://orcid.org/0000-0002-0188-945X

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Hard masks with high etch selectivity are essential for fabricating high-aspect-ratio nanostructures via deep and anisotropic plasma etching. While most two-dimensional materials are susceptible to plasma damage, we report that van der Waals metal oxyhalides, specifically CrOCl and FeOCl, exhibit extraordinary resistance to aggressive SF

Identifiers

PMID41807772

What OpenQuestion holds

Textmetadata
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.