Evidence map›Paper›PMID 41745145›Full record

ReviewNanomaterials (Basel, Switzerland)2026

Recent Advances in Diamond-Capped GaN HEMTs for RF Application.

Yuanmeng Xiang, Mei Wu, Haolun Sun, Shiming Li, Hongda Chen, Jiamin Wei, Binyan Yan, Ling Yang, Meng Zhang, Hao Lu and 3 more

Abstract readReview
In one paragraph

Review in Nanomaterials (Basel, Switzerland), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

13 authors.

Yuanmeng XiangNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Mei WuNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Haolun SunNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Shiming LiNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.ORCID 0000-0003-0977-040X
Hongda ChenNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.ORCID 0009-0004-6772-9661
Jiamin WeiNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Binyan YanNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Ling YangNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Meng ZhangNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.ORCID 0000-0001-8827-1398
Hao LuNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.ORCID 0000-0002-3189-7864
Bin HouNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.ORCID 0000-0002-5368-3699
Xiaohua MaNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.
Yue HaoNational Engineering Research Center of Wide Band-Gap Semiconductor, Faculty of Integrated Circuit, Xidian University, Xi'an 710126, China.

Funding

China Postdoctoral Science Foundation 2022T150505National Natural Science Foundation of China 62188102National Natural Science Foundation of China 62234009National Natural Science Foundation of China 62574152
6 · The paper itself

Abstract

Self-heating effects severely limit the performance of gallium nitride high-electron-mobility transistors (GaN HEMTs) in high-power radio frequency (RF) applications. Diamond capping technology leveraging diamond's exceptional thermal conductivity (>2000 W/m·K) has emerged as a highly promising near-junction cooling solution. However, its integration with GaN HEMTs faces challenges including lattice/thermal mismatch, high thermal boundary resistance (TBR), and process compatibility. This review summarizes recent progress in high-thermal-conductivity diamond film growth, TBR optimization, thermal simulations, and the integrated process with GaN devices. These technological breakthroughs enable diamond-capped GaN HEMTs with an excellent comprehensive performance. Continued advances in these fields will be critical for fully releasing the capabilities of diamond capping technology for GaN HEMTs in high-frequency and high-power applications.

Indexed as

diamond filmGaN HEMTsTBRthermal management

Identifiers

PMID41745145
PMCPMC12943555

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.