Evidence map›Paper›PMID 41644988›Full record

ArticleScientific reports2026

Wafer-scale formation of MoS

Naoya Okada, Shinichi Tanabe, Hitoshi Miura, Hao Cheng, Yumin Huang, Hisashi Warashina, Atsuki Fukazawa, Hiroki Maehara, Toshifumi Irisawa

Abstract read
In one paragraph

Article in Scientific reports, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

9 authors.

Naoya OkadaSemiconductor Frontier Research Center, National Institute of Advanced Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, 305- 8568, Ibaraki, Japan. okada-naoya@aist.go.jp.
Shinichi TanabeTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan. shinichi.tanabe@tel.com.
Hitoshi MiuraTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Hao ChengTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Yumin HuangTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Hisashi WarashinaTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Atsuki FukazawaTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Hiroki MaeharaTokyo Electron Limited, Akasaka Biz Tower, 3-1 Akasaka 5-chome, Minato-ku, Tokyo, 107-6325, Japan.
Toshifumi IrisawaSemiconductor Frontier Research Center, National Institute of Advanced Science and Technology (AIST), Tsukuba Central 2, 1-1-1 Umezono, Tsukuba, 305- 8568, Ibaraki, Japan.

Funding

New Energy and Industrial Technology Development Organization JPNP20017
6 · The paper itself

Abstract

Achieving uniform, high-quality, and thickness-controlled two-dimensional semiconductor films at the wafer scale remains a critical challenge for practical device integration. This work presents a scalable synthesis method for MoS

Identifiers

PMID41644988
PMCPMC12923741

What OpenQuestion holds

Textmetadata
LicenceCC BY-NC-ND
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.