CMOS-Compatible Micro Photovoltaic Generator with Post-Processing Enhanced Optical Absorption.

This work reports the design and realization of a silicon-based micro photovoltaic generator (MPG) fabricated using a standard 0.18 μm complementary metal oxide semiconductor (CMOS) technology. The device harvests optical energy and converts it into electrical power through the photovoltaic effect, leveraging a network of engineered p-n junctions formed within the semiconductor. A grid-structured architecture is adopted, in which patterned p-type regions are embedded inside an n-well platform. This configuration expands the effective junction area, increases carrier-collection paths, and strengthens the internal electric field, thereby enhancing photocurrent generation. To further improve optical coupling, a specialized post-CMOS treatment is introduced. A wet etching is used to selectively remove the silicon dioxide layer that normally covers the junction regions in CMOS processes. Eliminating this dielectric layer enables direct photon penetration into the depletion region minimizes reflection-related losses, resulting in a significant improvement in device performance. Under an illumination intensity of 1000 W/m