Evidence map›Paper›PMID 41521179›Full record

ArticleLight, science & applications2026

Meta-device for sensing subwavelength lateral displacement.

Shufan Chen, Yubin Fan, Hao Li, Xiaodong Qiu, Ben Wang, Lijian Zhang, Shumin Xiao, Din Ping Tsai

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Light, science & applications, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Shufan Chen *Department of Electrical Engineering and State Key Laboratory of Optical Quantum Materials, City University of Hong Kong, Kowloon, Hong Kong SAR, 999077, China.
Yubin Fan *Department of Electrical Engineering and State Key Laboratory of Optical Quantum Materials, City University of Hong Kong, Kowloon, Hong Kong SAR, 999077, China. yubinfan@cityu.edu.hk.
Hao Li *Ministry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Guangdong Provincial Key Laboratory of Semiconductor Optoelectronic Materials and Intelligent Photonic Systems, Harbin Institute of Technology, Shenzhen, China.
Xiaodong QiuDepartment of Electrical Engineering and State Key Laboratory of Optical Quantum Materials, City University of Hong Kong, Kowloon, Hong Kong SAR, 999077, China.
Ben WangNational Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, College of Engineering and Applied Sciences, Jiangsu Physical Science Research Center, Nanjing University, Nanjing, 210093, China.ORCID http://orcid.org/0009-0001-0484-4572
Lijian ZhangNational Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, College of Engineering and Applied Sciences, Jiangsu Physical Science Research Center, Nanjing University, Nanjing, 210093, China. lijian.zhang@nju.edu.cn.ORCID http://orcid.org/0000-0002-3247-9189
Shumin XiaoMinistry of Industry and Information Technology Key Lab of Micro-Nano Optoelectronic Information System, Guangdong Provincial Key Laboratory of Semiconductor Optoelectronic Materials and Intelligent Photonic Systems, Harbin Institute of Technology, Shenzhen, China. shumin.xiao@hit.edu.cn.ORCID http://orcid.org/0000-0002-0751-9556
Din Ping TsaiDepartment of Electrical Engineering and State Key Laboratory of Optical Quantum Materials, City University of Hong Kong, Kowloon, Hong Kong SAR, 999077, China. dptsai@cityu.edu.hk.ORCID http://orcid.org/0000-0002-0883-9906

Funding

City University of Hong Kong (CityU) Project No. 9380131, 9610628, and 7005867National Natural Science Foundation of China (National Science Foundation of China) 62375232
6 · The paper itself

Abstract

Accurate transverse displacement measurement is essential for precise mask-to-wafer positioning in lithography. While lateral displacement metrology has achieved nanometer-level precision, the limitations imposed by coherent state and grating challenge in-situ measurement speed and precision. Here, we introduce a two-photon state transverse displacement measurement method utilizing a polarization gradient metasurface by employing two-photon state interference. Compared with the classical method, our new method can experimentally reduce the number of detected photons to around 3% with equivalent precision. These attributes make the two-photon state polarization gradient metasurface approach highly suitable for integration with semiconductor lithography processes and show its promise in realizing equivalent measurement precision within notably shorter acquisition durations, providing a robust solution for next-generation transverse displacement measurement requirements.

Identifiers

PMID41521179
PMCPMC12791143

What OpenQuestion holds

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Registered trials

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.