ArticleResearch square2025
Modeling and Validation of Anisotropic Thin-Film Deposition on Cylindrical Substrates for Predictable Resistance Control in MEMS Fabrication.
Article in Research square, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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Abstract
Precise control of electrical properties in conductive micro-structures is essential for the performance and reliability of micro-electro-mechanical systems (MEMS). However, the nature of anisotropic physical vapor deposition (PVD), such as electron-beam or thermal evaporation on curved or wire-like substrates, complicates the prediction of thin-film morphology and resulting electrical properties. This study develops and validates a geometrically explicit deposition model describing film growth on cylindrical substrates using a generalized pseudo-Lambertian cosine emission profile. Analytical expressions for local film thickness are derived as functions of deposition time, substrate geometry, and source collimation. Monte Carlo simulations confirm that the model accurately reproduces the deposition profile observed with simulated data
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