Evidence map›Paper›PMID 41501007›Full record

ArticleMicrosystems & nanoengineering2026

Beyond binary patterning: polypropylene carbonate as a versatile thermal resist for high-fidelity grayscale Nanofabrication.

Hongtao Li, Jixiang Li, Zeming Jin, Haonan Ma, Shijie Zhao, Ziying Hu, Mingdi Zhang, Wenke Fu, Jiakai Wang, Yunyun Dai and 3 more

Abstract read
In one paragraph

Article in Microsystems & nanoengineering, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

13 authors.

Hongtao Li *School of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Jixiang Li *School of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Zeming JinSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Haonan MaSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Shijie ZhaoSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Ziying HuSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Mingdi ZhangSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Wenke FuSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Jiakai WangSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China.
Yunyun DaiSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China. yunyundai@bit.edu.cn.
Yuan HuangSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China. yhuang@bit.edu.cn.
Xia LiuSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China. xia.liu@bit.edu.cn.
Yeliang WangSchool of Integrated Circuits and Electronics, MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing, 100081, China. yeliang.wang@bit.edu.cn.

Funding

National Natural Science Foundation of China (National Science Foundation of China) Nos. 62274013 and 92163206Science Fund for Creative Research Groups (Fund for Creative Research Groups) No. 12321004
6 · The paper itself

Abstract

Thermal scanning probe lithography (t-SPL) is a high-resolution nanopatterning technique that employs a heated probe for precise, maskless patterning. Polypropylene carbonate (PPC) has emerged as a promising resist material for t-SPL due to its favorable thermal decomposition behavior. In this study, we investigate the use of PPC as a thermal resist in t-SPL, leveraging its chain unzipping and random scission mechanisms to achieve controlled material removal. The effects of various parameters on the patterning of PPC films, such as temperature, tip height, and force pulse, are systematically examined. Upon exposure to the heated tip, PPC undergoes localized sublimation at the contact area, enabling nanopatterning with the lateral resolution down to 50 nm and the vertical resolution down to sub-nanometer. This approach achieves stepped cyclic and sinusoidal grayscale patterns with controllable depth and size. Furthermore, we demonstrate grayscale pattern transfer by etching the PPC patterns into dielectric layers using optimized dry etching processes. This approach offers precise depth control and shows strong potential for applications in photonic and nano-electronic device fabrication.

Identifiers

PMID41501007
PMCPMC12780256

What OpenQuestion holds

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LicenceCC BY-NC-ND
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.