Evidence map›Paper›PMID 41470522›Full record

ReviewMicromachines2025

The Principle and Development of Optical Maskless Lithography Based Digital Micromirror Device (DMD).

Xianjie Li, Guodong Cui, Guili Xu

Abstract readReview
In one paragraph

Review in Micromachines, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.

0numbers the graph read from it
0cells of the map it votes in
1citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

1 citing paper in PubMed.

  1. Review
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

3 authors.

Xianjie LiCollege of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 21106, China.
Guodong CuiJiangsu Yingsu Integrated Circuit Equipment Co., Ltd., Xuzhou 221300, China.
Guili XuCollege of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 21106, China.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

A comprehensive review of the DMD-based optical lithography system has been conducted. The essence of the point-array with an oblique-scanning and stepping operation principle has been systematically analyzed, which will serve as the core driving force for its development and application. Similar to conventional lithography, the system development has been presented from the aspects of critical dimension (CD) resolution, overlay accuracy, and throughput. With the unique characterizations of the digital virtue mask, achievements are summarized from integrated circuit (IC) manufacturing to various micro-scale fabrication processes.

Indexed as

digital micromirror device (DMD)lithography toolmaskless optical lithography systemoblique scanning and steppingpoint array

Identifiers

PMID41470522
PMCPMC12735024

What OpenQuestion holds

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LicenceCC BY
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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.