Evidence map›Paper›PMID 41414688›Full record

ArticleSmall methods2026

VN Thin Films via MOCVD Using a New Vanadium Precursor: Linking Growth Chemistry to Functional Surface Properties.

Jean-Pierre Glauber, Julian Lorenz, Ji Liu, Marietta Seifert, Volker Hoffmann, Carlos Abad, Detlef Rogalla, Lars Giebeler, Corinna Harms, Michael Wark and 2 more

Abstract read
PubMed Full text at PMC Publisher
In one paragraph

Article in Small methods, 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 2 papers.

0numbers the graph read from it
0cells of the map it votes in
2citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

2 citing papers in PubMed.

  1. Review
  2. Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

12 authors.

Jean-Pierre GlauberInstitute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, 01069, Dresden, Germany.ORCID https://orcid.org/0000-0003-0015-2074
Julian LorenzInstitute of Engineering Thermodynamics, German Aerospace Center (DLR), 26129, Oldenburg, Germany.ORCID https://orcid.org/0000-0002-9936-7667
Ji LiuTyndall National Institute, University College Cork, T12R5CP, Cork, Ireland.ORCID https://orcid.org/0000-0001-7190-9869
Marietta SeifertInstitute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, 01069, Dresden, Germany.ORCID https://orcid.org/0000-0001-5106-9903
Volker HoffmannInstitute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, 01069, Dresden, Germany.ORCID https://orcid.org/0000-0001-8084-6476
Carlos AbadBundesanstalt für Materialforschung und-prüfung (BAM), 12205, Berlin, Germany.ORCID https://orcid.org/0000-0003-3928-3258
Detlef RogallaRUBION, Ruhr University Bochum, 44801, Bochum, Germany.ORCID https://orcid.org/0000-0002-5404-2498
Lars GiebelerInstitute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, 01069, Dresden, Germany.ORCID https://orcid.org/0000-0002-6703-8447
Corinna HarmsInstitute of Engineering Thermodynamics, German Aerospace Center (DLR), 26129, Oldenburg, Germany.ORCID https://orcid.org/0000-0001-5916-3224
Michael WarkInstitute of Chemistry, Carl von Ossietzky University Oldenburg, 26129, Oldenburg, Germany.ORCID https://orcid.org/0000-0002-8725-0103
Michael NolanTyndall National Institute, University College Cork, T12R5CP, Cork, Ireland.ORCID https://orcid.org/0000-0002-5224-8580
Anjana DeviInstitute for Materials Chemistry, Leibniz Institute for Solid State and Materials Research Dresden, 01069, Dresden, Germany.ORCID https://orcid.org/0000-0003-2142-8105

Funding

Deutsche Forschungsgemeinschaft 502054395Deutsche Forschungsgemeinschaft INST 184/144-1 FUGGHorizon 2020 871130Leibniz-Gemeinschaft P155/2023
6 · The paper itself

Abstract

Vanadium nitride (VN) is a promising material for many applications, including the electrochemical nitrogen reduction reaction (eNRR). Catalyst nanoengineering enables experimental validation of its predicted eNRR activity, but most VN catalysts are made by using methods that lack precise control. This study introduces a new metalorganic chemical vapor deposition (MOCVD) process for high-quality, faceted, and crystalline VN thin films. N,N'-diisopropylformamidinatovanadate [V(dpfamd)

Indexed as

catalyst nanoengineeringdensity functional theory (DFT) simulationelectrochemical nitrogen reductionmetalorganic chemical vapor depositionprecursor chemistriesstructure–property correlationvanadium nitride

Identifiers

PMID41414688
PMCPMC12893275

What OpenQuestion holds

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Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.