Evidence map›Paper›PMID 41372272›Full record

ArticleScientific reports2025

Analysis of physical mechanisms for channel-length-dependent PBTS reliability in SA TG coplanar IGZO TFTs.

Dong-Hwi Son, Chae-Eun Oh, Hyeon-Woo Lee, Chan-Yong Jeong, Jae-Man Jang, Byung-Du Ahn, Jong-Uk Bae, Hyuck-In Kwon

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Article in Scientific reports, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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5 · Who and what money

Authors and funding

8 authors.

Dong-Hwi Son *Major in Intelligent Semiconductor Engineering, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul, Korea.
Chae-Eun Oh *Major in Intelligent Semiconductor Engineering, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul, Korea.
Hyeon-Woo LeeMajor in Intelligent Semiconductor Engineering, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul, Korea.
Chan-Yong JeongResearch and Development Center, LG Display Company, Paju, 10845, Korea.
Jae-Man JangResearch and Development Center, LG Display Company, Paju, 10845, Korea.
Byung-Du AhnResearch and Development Center, LG Display Company, Paju, 10845, Korea.
Jong-Uk BaeResearch and Development Center, LG Display Company, Paju, 10845, Korea.
Hyuck-In KwonMajor in Intelligent Semiconductor Engineering, Chung-Ang University, 84 Heukseok-ro, Dongjak-gu, Seoul, Korea. hyuckin@cau.ac.kr.

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

This study investigates the physical mechanisms for channel-length-dependent positive bias temperature stress (PBTS) reliability in self-aligned top-gate (SA TG) coplanar indium-gallium-zinc oxide (IGZO) thin-film transistors (TFTs). We fabricated devices with channel lengths of 3 µm, 12 µm, and 20 µm and characterized them using high-low frequency capacitance-voltage measurements and low-frequency noise analysis. Experimental results show that the 3 µm channel length device exhibits a significantly lower subgap density of states in the IGZO channel and a reduced near-interface trap density in the gate dielectric compared to its longer-channel counterparts. These reductions are strongly correlated with the enhanced PBTS reliability of the short-channel SA TG coplanar IGZO TFTs. We propose that hydrogen diffusion from the n

Indexed as

Channel lengthHydrogen diffusionNear-interface gate dielectric trap densityPBTS reliabilitySA TG coplanar IGZO TFTsSubgap DOS

Identifiers

PMID41372272
PMCPMC12695868

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