Atomic Layer Deposition of AgX (X = Cl, Br, I) Thin Films.

Aida Heidari, Georgi Popov, Timo Hatanpää, Alexander Weiß, Mykhailo Chundak, Kenichiro Mizohata, Mikko Ritala, Marianna Kemell

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Article in ACS omega, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

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5 · Who and what money

Authors and funding

8 authors.

Aida HeidariDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0009-0002-7777-6483

Georgi PopovDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0000-0003-1233-8327

Timo HatanpääDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0000-0003-3745-8296

Alexander WeißDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0000-0001-5585-2655

Mykhailo ChundakDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.

Kenichiro MizohataDepartment of Physics, University of Helsinki, Helsinki FI-00014, Finland.

Mikko RitalaDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0000-0002-6210-2980

Marianna KemellDepartment of Chemistry, University of Helsinki, Helsinki FI-00014, Finland.ORCID https://orcid.org/0000-0002-3583-2064

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

Silver halides (AgX, X = Cl, Br, I) are promising materials for various applications, including optical, medical, and electronic technologies, due to their light sensitivity, high refractive index, and antiseptic properties. Silver halides are also important constituents of Pb-free photovoltaic materials such as rudorffites and double halide perovskites. This study presents atomic layer deposition (ALD) processes for the deposition of silver halide thin films using (2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionato)-silver-(I)-triethylphosphine (Ag-(fod)-(PEt

Identifiers

PMID41322615

DOI10.1021/acsomega.5c06913

PMCPMC12658672

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Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.