Evidence map›Paper›PMID 41299165›Full record

ArticleNature2025

Ferroelectric transistors for low-power NAND flash memory.

Sijung Yoo, Taek Jung Kim, Seung-Geol Nam, Donghoon Kim, Kihong Kim, Yunseong Lee, Moonil Jung, Kwang-Hee Lee, Seokhoon Choi, Seung Dam Hyun and 24 more

Abstract read
PubMed Publisher
In one paragraph

Article in Nature, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 5 papers.

0numbers the graph read from it
0cells of the map it votes in
5citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

5 citing papers in PubMed.

  1. Thickness Engineering in HfONanomaterials (Basel, Switzerland) · 2026
    Review
  2. Article
  3. Article
  4. Wake-Up and Fatigue under Electrical Cycling in HfOAdvanced science (Weinheim, Baden-Wurttemberg, Germany) · 2026
    Review
  5. TiONano convergence · 2026
    Article
4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

34 authors.

Sijung YooThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.ORCID http://orcid.org/0000-0002-5013-8564
Taek Jung KimThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Seung-Geol NamThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Donghoon KimThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.ORCID http://orcid.org/0000-0003-4061-2899
Kihong KimThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Yunseong LeeThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Moonil JungThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Kwang-Hee LeeThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Seokhoon ChoiThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Seung Dam HyunThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Min-Hyun LeeThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.ORCID http://orcid.org/0000-0001-7930-8638
Seogwoo HongThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Haesung KimThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Ki Deok BaeThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Hyangsook LeeAnalytical Engineering Group, Material Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Jung Yeon WonAnalytical Engineering Group, Material Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Dong-Jin YunAnalytical Engineering Group, Material Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Byeong Gyu ChaeAnalytical Engineering Group, Material Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Wook Ghee HahnSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Chang Hyun JooSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Sanghyun JoThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.ORCID http://orcid.org/0000-0003-2037-2883
Yoonsang ParkThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Kyung Mee SongThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Kyooho JungThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Suhwan LimSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Kwangyou SeoSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Kwangsoo KimSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Wanki KimSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.
Daewon HaSemiconductor Research and Development Center, Samsung Electronics, Hwaseong, Korea.ORCID http://orcid.org/0000-0002-9061-8626
Jee-Eun YangThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Seung-Yeul YangThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.
Sangwook KimThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea. nofate.kim@samsung.com.ORCID http://orcid.org/0009-0007-7244-0063
Jinseong HeoThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea.ORCID http://orcid.org/0000-0003-2530-488X
Duk-Hyun ChoeThin Film Technical Unit, Device Research Center, Samsung Advanced Institute of Technology (SAIT), Samsung Electronics, Suwon, Korea. dukhyun.choe@samsung.com.ORCID http://orcid.org/0000-0002-2775-8976

Funding

No grant is acknowledged in the PubMed record.

6 · The paper itself

Abstract

NAND flash memory is essential in modern storage technology, amid growing demands for low-power operation fuelled by data-centric computing and artificial intelligence

Identifiers

What OpenQuestion holds

Textmetadata
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.