ReviewAdvanced materials (Deerfield Beach, Fla.)2026
Developments in Nanopatterning of Graphene; Toward Direct Writing.
Review in Advanced materials (Deerfield Beach, Fla.), 2026. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Cited by 1 paper.
What it found
Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.
The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
The trial behind it
Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.
Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.
Who cites it
1 citing paper in PubMed.
- Developments in Nanopatterning of Graphene; Toward Direct Writing.Advanced materials (Deerfield Beach, Fla.) · 2026Review
Corrections and comments
PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.
Authors and funding
5 authors.
Funding
Abstract
Graphene, with its exceptional electronic, mechanical, and thermal properties, remains a cornerstone material for next-generation nanoelectronics. However, conventional lithographic approaches to graphene patterning are fraught with challenges, including contamination, alignment complexity, and scalability constraints. This review critically examines the evolving landscape of direct-write graphene technologies, focusing on forefront strategies such as focused electron beam-induced deposition (FEBID), polymer-to-graphene (P2G) conversion, focused ion beam (FIB) modification, and laser-assisted graphitisation. These techniques represent a departure from traditional top-down or transfer-based methods by enabling bottom-up, spatially resolved patterning without intermediary masking steps. Particular attention is devoted to the physicochemical mechanisms that underlie electron- and photon-mediated graphitisation, the role of precursor chemistry and substrate interactions, as well as the influence of beam parameters on sp
Indexed as
Identifiers
What OpenQuestion holds
Registered trials
Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.