Evidence map›Paper›PMID 41156339›Full record

ArticleMicromachines2025

Optimizing Annealing Temperature for Enhanced Electrical Performance and Stability of Solution-Processed In

Taehui Kim, Seullee Lee, Ye-Won Lee, Dongwook Kim, Youngjun Yun, Jin-Hyuk Bae, Hyeonju Lee, Jaehoon Park

Abstract read
In one paragraph

Article in Micromachines, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.

0numbers the graph read from it
0cells of the map it votes in
0citing papers in PubMed
–field-weighted citation impact
1 · What the graph read from it

What it found

Each row is one number read from the abstract, on the scale the paper reported it, with its interval. Left of the dashed line favours the treatment, right favours the comparator. Under each row is the sentence it came from. New to these charts? A ten-minute tutorial.

The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.

2 · The registry

The trial behind it

Trials whose registry record cites this paper, or whose number appears in the abstract. A trial that started after this paper was published is citing it as background, not reporting it.

Neither the registry nor the abstract names a trial number. If this is a trial report, that itself is worth knowing.

3 · Its place in the literature

Who cites it

0 citing papers in PubMed.

No citing paper in PubMed yet.

4 · The record

Corrections and comments

PubMed lists nothing against this paper. Absence here is not a guarantee, only a check that was made.

5 · Who and what money

Authors and funding

8 authors.

Taehui KimSchool of Semiconductor Display Technology, Hallym University, Chuncheon 24252, Republic of Korea.
Seullee LeeSchool of Nano Convergence Technology, Hallym University, Chuncheon 24252, Republic of Korea.
Ye-Won LeeSchool of Nano Convergence Technology, Hallym University, Chuncheon 24252, Republic of Korea.
Dongwook KimSchool of Semiconductor Display Technology, Hallym University, Chuncheon 24252, Republic of Korea.
Youngjun YunSchool of Semiconductor Display Technology, Hallym University, Chuncheon 24252, Republic of Korea.ORCID 0000-0002-3639-9741
Jin-Hyuk BaeSchool of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.ORCID 0000-0003-3217-1309
Hyeonju LeeSchool of Semiconductor Display Technology, Hallym University, Chuncheon 24252, Republic of Korea.
Jaehoon ParkSchool of Semiconductor Display Technology, Hallym University, Chuncheon 24252, Republic of Korea.

Funding

Hallym University HRF-202501-019
6 · The paper itself

Abstract

This study investigates the influence of post-deposition thermal annealing temperature on the crystal structure, chemical composition, and electrical performance of solution-processed indium oxide (In

Indexed as

hysteresisindium oxideRaman-spectroscopysolution-processedthermal annealingthin-film transistor

Identifiers

PMID41156339
PMCPMC12566397

What OpenQuestion holds

Textmetadata
LicenceCC BY
Read underepoch 390

Registered trials

None linked

Read under generation 80e0d062 · epoch 390. Bibliography from PubMed, PubMed Central and OpenAlex; grants from NIH RePORTER; trial links from ClinicalTrials.gov; estimates, votes and beliefs from the OpenQuestion graph.