ArticleACS omega2025
Graphene Growth via Plasma-Enhanced Hybrid Physical-Chemical Vapor Deposition: A Catalyst-Free Approach.
Article in ACS omega, 2025. The graph could read no effect estimate from its abstract, so it casts no vote on the map. Not yet cited in PubMed.
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The abstract states no effect estimate the extractor could read, or names no intervention and outcome on the map, so this paper lights no cell and moves no belief. It is still indexed, cited and linked below.
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4 authors.
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Abstract
Graphene, with its prominent electrical properties, holds promise as an ideal material for a diverse range of applications, from electronics to optics. Yet, the feasibility of large-area integration in graphene remains constrained by its reliance on metal-based synthesis methods. Integrating graphene onto dielectric substrates is vital for microelectronic device fabrication. Hence, the catalyst-free fabrication of graphene emerges as a crucial pursuit for the future of microelectronic devices, aligning with the demands of integrated electronic technology. Here, we propose a plasma-enhanced hybrid physical-chemical vapor deposition (PE-HPCVD) method as a novel technique for the catalyst-free synthesis of graphene. Although the work is at its initial stages, it provides promising results of achieving large-area graphene sheets directly on silicon or SiO
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